hardness of boron carbide
Release time:
2018-10-24
e deposited amorphous thin films of boron carbide by pulsed laser
deposition using a B 4 C target at room temperature. As the laser
fluence increased from 1 to 302J/cm 2 , the number of 0.25–502μm
particulates embedded in the films decreased, and the B/C atomic ratio
of the films increased from 1.8 to 3.2. The arrival of melt droplets,
atoms, and small molecular species depending on laser fluence appeared
to be involved in the film formation. In addition, with increasing
fluence the nanoindentation hardness of the films increased from 14 to
3202GPa. We believe that the dominant factor in the observed increase in
the films’ hardness is the arrival of highly energetic ions and atoms
that results in the formation of denser films.
Previous:boron carbide formula
